Entegris AMC Filters

Solution for airborne molecular contamination (AMC) control

Entegris provides a portofolio of airborne molecular contamination control to help you control contaminants in the entire lab and protecting both process equipment and wafer from the damaging effects of AMC.

• Stepper and Scanner Filters
  Entegris’ stepper and scanner filters are designed to provide reliable protection from airborne molecular contamination sources. Use Entegris filters confidently in a variety of work areas and tool makers.


• Process Tool Air Filters
  Entegris tool AMC filters provide superior protection from common AMC in the fab including molecular acids, bases and organics. Tool AMC filters utilize both standard filtration media and custom media blends to meet various AMC removal requirements.


• Cleanroom Filtration
  Superior protection for advanced semiconductor manufacturing environments at sub-65 nm modes. Field- and lab-proven for use in semiconductor manufacturing environments, including lithography, etch, CPM, metrology and reticle storage areas.


• Filter Housing for DUV, EUV Scanners
  Chemically purify environmental air used in photolithography exposure tools. These filters housing protect exposure tools from a full range of airborne molecular contaminants.